The 69th JSAP Spring Meeting 2022

Presentation information

Oral presentation

15 Crystal Engineering » 15.7 Crystal characterization, impurities and crystal defects

[26p-E104-1~11] 15.7 Crystal characterization, impurities and crystal defects

Sat. Mar 26, 2022 1:30 PM - 4:30 PM E104 (E104)

Kazuhisa Torigoe(SUMCO), Takuo Sasaki(QST), Hiroyuki Tsubota(GlobalWafers Japan)

3:45 PM - 4:00 PM

[26p-E104-9] Quality of silicon substrate and point defects
(7) Six fundamental equation sets for understanding and control of defects

〇Naohisa Inoue1, Shuichi Kawamata1, Shuichi Okuda1 (1.Osaka Pref. Univ. Radiation Research Center)

Keywords:silicon crystal, defect, point defect

History of research on Si is divided into 5 periods: 1)Tr&IC 1955-, 2)IC chip 1975-, 3)system on Si 1995-, 4)Power device 2005-, 5)solar device 2015-. In the 20 th century, Si devices served as the neurons of the IT world. In the 21 st century, in addition to IT world, they are the key components of the sustainable earth. Behavior of impurities, point defects and grown-in defects has been understood by the following six fundamental equation sets. They serve as the base for the defect control in Si substrates for all devices. (1) mass action law, (ii) classical nucleation theory, (iii) diffusion equation including the contribution from point defects, (iv) Voronkov criterion, (v) stress effect and (vi) group sum constant theorem.