[26p-F308-1~4] 7.3 Micro/Nano patterning and fabrication

[26p-F308-1] Improvement of Resist Patterns Projected by the Parabolic Mirror System Using the One-sided Illumination

〇Toshiyuki Horiuchi¹, Hiroshi Kobayashi¹ (1.Tokyo Denki Univ.)

Keywords:stereophonic projection lithography, parabolic mirror, one-sided illumination

It was demonstrated in the past research that 200-µm line-and-space patterns were successfully printed by the newly proposed stereophonic projection exposure system using parabolic mirrors. However, the patterned areas were limited in small areas around the exposure field center. For this reason, causes of the patterned area limitations were discussed referring to ray-trace analyses of imaging light and experimental results. If an original reticle was illuminated from various meridional directions, projected images with differently deformed shapes were superimposed and the image contrast was degraded at the outside parts of the exposure field. Considering the deformation shape of the exposure field, the one-sided illumination was tried for printing 200-µm line-and-space patterns. As a result, patterns were properly printed with high contrast in a whole field of 10 mm square. The field distortion or the straightness of patterns was also improved.