Yusuke Ando

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Speaker, Author, Co-Author

Fri. Mar 17, 2023 9:00 AM - 11:30 AM A205 (Building No. 6)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17a-A205-1~9] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

10:45 AM - 11:00 AM

△ [17a-A205-7] Improvement in Etch Resistance of Hydrogenated Amorphous Carbon Films Based on Contribution Analysis of Process Parameters

〇(M1)Yusuke Ando¹, Hiroki Kondo², Kenji Ishikawa², Takayoshi Tsutsumi², Makoto Sekine², Masaru Hori² (1.Nagoya Univ. Eng., 2.Nagoya Univ. cLPS)