Mickael Lozach

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Speaker, Author, Co-Author

Wed. Mar 15, 2023 9:00 AM - 11:30 AM B410 (Building No. 2)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[15a-B410-1~9] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

9:00 AM - 9:15 AM

▲ [15a-B410-1] Investigation of the Gate Oxide of Si MOS Devices Fabricated Using Minimal Fab Laser Annealing Tool

〇Mickael Lozach¹, Kazushige Sato^1,2, Sommawan Khumpuang^1,3, Shiro Hara^1,3,4 (1.Minimal Fab, 2.Sakaguchi E.H. VOC, 3.AIST, 4.Hundred)