Kazumasa Nemoto

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Speaker, Author, Co-Author

Wed. Mar 15, 2023 9:00 AM - 11:30 AM B410 (Building No. 2)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[15a-B410-1~9] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

10:30 AM - 10:45 AM

[15a-B410-6] Highly efficient rinsing method in spin droplet cleaning technology

〇Kazumasa Nemoto¹, Takashi Yajima¹, Noriko Miura², Kazushige Sato², Sommawan Khumpuang^1,2, Shiro Hara^1,2,3 (1.AIST, 2.Minimal Fab, 3.Hundred)