Noriko Miura

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Speaker, Author, Co-Author

Wed. Mar 15, 2023 9:00 AM - 11:30 AM B410 (Building No. 2)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[15a-B410-1~9] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

11:15 AM - 11:30 AM

[15a-B410-9] Development of Minimal Fab Ion Implantation Tool (IV)

〇Noriko Miura¹, Naoki Hashimoto², Yoshitaka Kitamura², Fumito Imura^3,4, Yuuki Ishida^1,3, Sommawan Khumpuang^1,3, Shiro Hara^1,3,4 (1.MINIMAL, 2.FUJI IMVAC INC., 3.AIST, 4.Hundred)

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