JoongWon Shin

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Speaker, Author, Co-Author

Wed. Mar 15, 2023 1:00 PM - 6:30 PM A404 (Building No. 6)

Oral presentation
| 6 Thin Films and Surfaces
| 6.1 Ferroelectric thin films

[15p-A404-1~19] 6.1 Ferroelectric thin films

2:00 PM - 2:15 PM

▼ [15p-A404-5] Effects of plasma damage reduction for Pt gate electrode deposition on the variation of MFSFET characteristics with ferroelectric nondoped HfO₂

〇(D)JoongWon Shin¹, Masakazu Tanuma¹, Shun-ichiro Ohmi¹ (1.Tokyo Inst. of Technology)