Soichiro Eto

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Speaker, Author, Co-Author

Thu. Mar 16, 2023 1:30 PM - 7:00 PM A402 (Building No. 6)

Symposium (Oral)
| Symposium
| What is Plasma-Driven Science - Expectations for New Developments in Plasma Processes

[16p-A402-1~10] What is Plasma-Driven Science - Expectations for New Developments in Plasma Processes

3:15 PM - 3:30 PM

[16p-A402-4] 【Highlighted Presentation】Development of Leaning Algorithm for Improving Precision of Etching Depht Monitor Using Machine Learning

〇Soichiro Eto¹, Nakamoto Shigeru², Fukuchi Kosuke² (1.Hitachi, Ltd., 2.Hitachi High-Tech Corp.)