Zuhao Wang

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Speaker, Author, Co-Author

Thu. Mar 16, 2023 1:00 PM - 5:45 PM B508 (Building No. 2)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[16p-B508-1~17] 13.3 Insulator technology

5:00 PM - 5:15 PM

[16p-B508-15] Effects of thermal annealing on the charge trapping characteristics of silicon nitride films for nonvolatile memory applications

〇Zuhao Wang¹, Kenshi Kimoto³, Soichiro Nakagawa¹, Mitsuhiro Sashida², Kento Nakamura², Fumiya Fujino², Kunimitsu Maejima³, Kiyoteru Kobayshi^1,2 (1.Tokai Univ., Gra. Sch. Eng., 2.Tokai Univ., Sch. Eng., 3.ESCO, Ltd.)

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