Ryuto Ichikawa

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Speaker, Author, Co-Author

Fri. Mar 17, 2023 1:30 PM - 3:30 PM PA06 (Poster)

Poster presentation
| 6 Thin Films and Surfaces
| 6.1 Ferroelectric thin films

[17p-PA06-1~14] 6.1 Ferroelectric thin films

1:30 PM - 3:30 PM

[17p-PA06-11] Growth mechanism of ALD-HfO₂ thin films
deposited by restricting the growth space near the substrate

〇Ryuto Ichikawa¹, Shuya Takarae², Keigo Naito¹, Takeshi Yoshimura¹, Norifumi Fujimura¹ (1.Osaka Metropolitan Univ., 2.Osaka Pref. Univ.)