The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[15a-A301-1~8] 15.6 Group IV Compound Semiconductors (SiC)

Wed. Mar 15, 2023 9:30 AM - 11:30 AM A301 (Building No. 6)

Takeshi Tawara(富士電機)

9:30 AM - 9:45 AM

[15a-A301-1] Relationship between Charge States of Silicon Vacancies in 4H-SiC and Doping Concentrations

Shengjie Zhang1,2, Shin-ichiro Sato1, Koichi Murata3, Masafumi Hanawa3, Shu Motoki2,1, Qihang Zhang1,2, Hidekazu Tsuchida3, Yasuto Hijikata2, Takeshi Ohshima1 (1.QST, 2.Saitama Univ., 3.CRIEPI)

Keywords:Silicon Carbide, High Energy Electron Irradiation, Silicon Vacancy

Silicon vacancies with -1 valence in silicon carbide (SiC) are expected to be applied as "quantum sensors" that can detect magnetic field and temperature with high sensitivity, but the charge state of silicon vacancies changes with doping concentration, and it is necessary to clarify the relationship. In this study, 4H-SiC with different doping concentrations were irradiated with high-energy electron beams to form silicon vacancies, and their charge states were analyzed based on photoluminescence (PL) measurements.