The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[15p-A301-1~13] 15.6 Group IV Compound Semiconductors (SiC)

Wed. Mar 15, 2023 1:00 PM - 4:45 PM A301 (Building No. 6)

Takeshi Mitani(AIST), Hirokuni Asamizu(ローム)

3:30 PM - 3:45 PM

[15p-A301-9] Study on Four-point probe Measurement of SiC Substrates in Laser Doping

Kaname Imokawa1, Ryoichi Nohdomi1, Yasutsugu Usami1, Rei Hobara2, Shuji Hasegawa2 (1.Gigaphoton Inc., 2.Tokyo Univ.)

Keywords:laser doping, SiC, four-point probe measurement of resistance

Four-probe measurements of common semiconductors such as Si, Ge, and GaAs are widely used for accurate measurement of resistivity. However, SiC substrates, which are known as widegap semiconductors, are not often used for four-probe measurement due to high Schottky barrier.
We are going to report that a high-concentration nitrogen-doped n-type layer exceeding the solid solubility limit was formed by laser length measurement and the sheet resistance of the surface was investigated using a commercially available four-probe resistance measurement device and a micro four-terminal laser device.