The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

[15p-B309-1~19] 8.1 Plasma production and diagnostics

Wed. Mar 15, 2023 1:00 PM - 6:45 PM B309 (Building No. 2)

Tsuyohito Ito(Univ. of Tokyo), Manabu Tanaka(Kyushu Univ.)

6:15 PM - 6:30 PM

[15p-B309-18] High Current and Low Voltage Discharge from DC Plasma Source with Boron-Doped Diamond Hollow Cathode

Hisao Miyazaki1, Hisashi Yoshida1, Shigeya Kimura1 (1.Toshiba RDC)

Keywords:plasma source, electron source, diamond

We develop a plasma source which utilizes properties of diamond such as high electron emission yield by a negative electron affinity, a high sputtering resistance against ion bombardment, a high melting point, and a high thermal conductivity. A DC discharge cathode is prototyped to obtain efficient ionization and high secondary electron emission yield which are realized by a hollow cathode with an axial magnetic field and with a boron-doped diamond electron emission layer coated inside a Mo cylinder cathode. As a result, we observed a DC discharge mode with a peak current of 100 A and an anode-cathode voltage of 90 V in hydrogen at 30 Pa.