The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

[15p-B309-1~19] 8.1 Plasma production and diagnostics

Wed. Mar 15, 2023 1:00 PM - 6:45 PM B309 (Building No. 2)

Tsuyohito Ito(Univ. of Tokyo), Manabu Tanaka(Kyushu Univ.)

3:30 PM - 3:45 PM

[15p-B309-9] A Miniaturized Optical-Interference Contactless Thermometry (OICT) System with Optical-Fiber and Real-Time Temperature Measurement

Ryunosuke Goto1, Kenshiro Horiuchi2, Jiawen Yu2, Hiroaki Hanafusa2, Seiichiro Higashi2 (1.Hiroshima Univ., 2.Grad. Sch. Ad. Sci. Eng.)

Keywords:SiC, thermometry, optical-fiber

In plasma processing, direct measurement of wafer surface and internal temperature is very important for process control. We have developed an optical-interference contactless thermometry (OICT) based on the principle that a laser beam is irradiated from the backside of a wafer and the reflected light interferes with the wafer as its temperature changes. However, the large size of the optical system, in which the laser lens barrel and optical system are integrated into a single unit, has imposed a significant limitation on the installation location for wafer temperature measurement inside a vacuum apparatus, for example. In this study, we attempted to downsize the system by separating the laser and optical system using optical fiber. We also developed an analysis program for real-time temperature measurement.