[16a-A402-1~6] 8.1 Plasma production and diagnostics

[16a-A402-6] Effect of power modulation scheme on ion composition in a dual-frequency capacitively-coupled Ar/C₄F₈/O₂ plasma

〇Haruhito Kato¹, Yudai Akatuka¹, Yuto Seki¹, Shuichi Kuboi¹, Haruka Suzuki^1,2, Hirotaka Toyoda^1,2,3 (1.Nagoya Univ, 2.cLPS, Nagoya Univ, 3.NIFS)

Keywords:plasma, ion, time-resolved

Time-resolved measurements of the ion composition in Ar/C₄F₈/O₂ plasmas were investigated to determine how the ion composition is changed by the power modulation scheme. Power modulation was performed under On-Off and High-Low control. The results suggest that electron temperature changes and associated ion composition changes are induced during power modulation.