The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[16p-B401-1~13] 15.4 III-V-group nitride crystals

Thu. Mar 16, 2023 1:00 PM - 5:45 PM B401 (Building No. 2)

Yoshio Honda(Nagoya Univ.), Hisashi Murakami(TUAT), Atsushi Yamaguchi(Kanazawa Inst. of Tech.)

2:00 PM - 2:15 PM

[16p-B401-3] [The 44th Young Scientist Award Speech] Low-threshold-current (~85 mA) AlGaN-based UV-B laser diode with refractive-index waveguide structure

Shunya Tanaka1, Yuya Ogino1, Kazuki Yamada1, Reo Ogura1, Shohei Teramura1, Moe Shimokawa1, Sakaya Ishizuka1, Sho Iwayama1,2, Kosuke Sato3, Hideto Miyake2, Motoaki Iwaya1, Tetsuya Takeuchi1, Satoshi Kamiyama1 (1.Meijo Univ., 2.Mie Univ., 3.Asahi Kasei)

Keywords:AlGaN, LD, UV

We report on a refractive-index waveguide AlGaN-based ultraviolet-B band (UV-B) laser diode grown on a sapphire substrate, which achieves a laser oscillation at a low threshold current (Ith), ~85 mA. The refractive index waveguide structure in a ridge-type structure is fabricated by a unique method combining dry inductively coupled plasma reactive ion etching and wet etching with tetramethylammonium hydroxide solution. Using this structure, the longitudinal-mode transverse optical confinement is successfully achieved, in which the ridge width is set to 3 μm, demonstrating a low Ith of UV-B laser diode.