The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

17 Nanocarbon Technology » 17.3 Layered materials

[16p-B414-1~16] 17.3 Layered materials

Thu. Mar 16, 2023 1:00 PM - 5:15 PM B414 (Building No. 2)

Hiroki Hibino(Kwansei Gakuin Univ.), Yusuke Hoshi(Tokyo City Univ.)

1:30 PM - 1:45 PM

[16p-B414-3] Local deep level transient spectroscopy measurement of MoS2 mechanically exfoliated on SiO2 using scanning nonlinear dielectric microscopy

Taiyo Ishizuka1,2, Kohei Yamasue2 (1.Tohoku Univ., 2.RIEC, Tohoku Univ.)

Keywords:layered semiconductor, Scanning Nonlinear Dielectric Microscopy

Local deep level transient spectroscopy (DLTS) based on Scanning Nonlinear Dielectric Microscopy (SNDM) was applied to a layered semiconductor, Molybdenum Disulfide (MoS2). The interface level density (Dit) of MoS2 was measured using local DLTS, and high Dit was detected at the edge of MoS2. The above results indicate that SNDM can be used to microscopically observe and evaluate the physical properties of the edges of layered semiconductors.