[16p-D215-1~16] 11.5 Junction and circuit fabrication process, digital applications

[16p-D215-6] Investigation of fabrication methods of large-area superconducting quantum circuits using an ArF immersion lithography system

〇Satoru Odate¹, Saito Naooki¹, Suzuki Kosuke¹, Aoyama Hajime¹, Tsukamoto Hiroyuki¹, Kusuyama Koichi², Nakamura Yasunobu^2,3 (1.Nikon Corp, 2.Riken, 3.U. of Tokyo)

Keywords:Superconducting circuits

The race to develop methods for fabricating large-scale superconducting quantum circuits has begun all over the world, recently. We have started to develop a method for fabricating large-scale quantum circuits on 12-inch silicon wafers using an ArF immersion lithography system within Japanese National R&D fund program. We will explain the progress of this development.