2023年第70回応用物理学会春季学術講演会

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一般セッション(口頭講演)

10 スピントロニクス・マグネティクス » 10.4 半導体・トポロジカル・超伝導・強相関スピントロニクス

[16p-D704-1~18] 10.4 半導体・トポロジカル・超伝導・強相関スピントロニクス

2023年3月16日(木) 13:30 〜 18:30 D704 (11号館)

福島 鉄也(東大)、名和 憲嗣(三重大)、小林 正起(東大)

16:15 〜 16:30

[16p-D704-11] Gate modulation of current in the metal-insulator transition region of La0.67Sr0.33MnO3

Tatsuro Endo1、Shun Tsuruoka1、Yuriko Tadano1、Shingo Kaneta-Takada1、Le Duc Anh1,2、Masaaki Tanaka1,2、Shinobu Ohya1,2 (1.EEIS, Univ. of Tokyo、2.CSRN, Univ. of Tokyo)

キーワード:oxide electronics, spintronics, metal-insulator transition

Within a single perovskite oxide, transition metal cations with different valences may coexist, and at specific composition ratios, they undergo abrupt property changes or phase transitions. For example, (La,Sr)MnO3 (LSMO) exhibits metal-insulator transition (MIT) when oxygen deficiencies are incorporated. This fact allows us to induce MIT at the intended locations of a thin LSMO layer by implementing oxygen vacancies. Recently, we formed an insulating nano-channel region by inducing the MIT in the LSMO and made a planar two-terminal spin-valve device with an extremely large magnetoresistance ratio of 140%. In this work, we report a current modulation of a nanoscale MIT channel by a gate electric field. We experimentally confirmed that the electric current decreases when the positive gate voltage is applied and reproduced the current modulation theoretically by considering the change in the tunnel barrier height induced by the carrier density modulation due to the capacitance of the STO substrate.