[16p-PA03-1~6] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[16p-PA03-5] Development of the atmospheric pure ozone water generator

〇Toshinori Miura¹, Naoki Kato¹, Akitoshi Nakagawa¹, Satoshi Seike¹ (1.Meidensha Corp.)

Keywords:Ozonated water, semiconductor manufacturing process, Chemical cleaning

We have developed a device that can supply ultra-high concentration ozonated water of 400ppm or more at atmospheric pressure by using ozone gas with a concentration of about 100% without using the pressurization method that has been used to increase the concentration of ozonated water. High-concentration ozone gas may cause an explosive reaction, so the dissolution part is designed to be depressurised less than 30kPa. This ozonated water is expected to be a substitute for harmful chemicals used in the semiconductor manufacturing process, etc., for which use restrictions have been demanded in recent years from the viewpoint of reducing environmental impact.