2023年第70回応用物理学会春季学術講演会

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6 薄膜・表面 » 6.3 酸化物エレクトロニクス

[16p-PA08-1~18] 6.3 酸化物エレクトロニクス

2023年3月16日(木) 16:00 〜 18:00 PA08 (ポスター)

16:00 〜 18:00

[16p-PA08-9] Epitaxial Growth of Meta-stable Hf0.5Zr0.5O2

〇(D)Yufan Shen1、Daisuke Kan1、Yuichi Shimakawa1 (1.Kyoto Univ. ICR)

キーワード:ferroelectric

Meta-stable oxides can be epitaxially stabilized via heterointerfaces. Recently, it was shown that the meta-stable orthorhombic fluorite oxide Hf0.5Zr0.5O2 (HZO) films were epitaxially grown on perovskite oxides. However, how the meta-stable structure of HZO can be stabilized on the perovskite oxides’ surfaces is still unclear. In this study, by pulsed laser deposition, we epitaxially grew HZO thin films on (100) SrTiO3 (STO) substrates, which were buffered by either La0.7Sr0.3MnO3 and LaMnO3, and investigated structural and ferroelectric properties of HZO films.