[17a-D419-1~12] 6.4 Thin films and New materials

△ [17a-D419-4] Low Refractive Index of TiO₂Thin Film Deposited by Combination Coating Method

〇(M1)Kosuke Endo¹, Hiroshi Murotani¹, Takayaki Matsudaira² (1.Tokai Univ., 2.SHINCRON co.,Ltd)

Keywords:optical thin film, titanium oxide

In this laboratory, we have developed combination coating method in which the EB deposition and DC pulse sputtering methods are installed in the same vacuum vessel and operated simultaneously. In a previous research, we have successfully reduced the refractive index of SiO₂, MgF₂, and Al₂O₃ optical thin films by this method, but it was suggested that crystalline thin films may be more difficult to reduce the refractive index. We would like to investigate the relationship between crystallinity and low refractive index by reducing the refractive index of TiO₂ thin films, which can be both amorphous and crystalline films. In this study, we investigated the low refractive index of TiO₂ films.