The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[17a-D419-1~12] 6.4 Thin films and New materials

Fri. Mar 17, 2023 9:00 AM - 12:00 PM D419 (Building No. 11)

Mamoru Yoshimoto(Tokyo Tech), Hiroyasu Yamahara(The Univ. Tokyo)

10:00 AM - 10:15 AM

[17a-D419-5] Hydrophilicity Evaluation of Low Refractive Index SiO2 Optical Thin Films by Electron Beam and Sputtering Evaporation part5

〇(M2)Mutsuki Ito1, Takayuki Matsudaira2, Hiroshi Murotani1 (1.Tokai Univ., 2.SHINCRON Co.,Ltd.)

Keywords:optical thin film, hydrophilicity

We have developed a combination coating method in which DC pulse sputtering and EB deposition are operated simultaneously in the same vacuum chamber, and have succeeded in producing SiO2 optical thin films with a low refractive index. Ordinary SiO2-coated glass is hydrophilic immediately after film deposition, but loses hydrophilicity in about one week. In contrast, the combination coating method maintains hydrophilicity even after one year from the deposition. The purpose of this study is to evaluate the mechanism of hydrophilicity of SiO2 optical thin films with low refractive index.