Fabrication of Multiple Polarity Inverted AlN Structures by Multiple Sputtering and High-Temperature Annealing

Tomohiro Tamano; Kanako Shojiki; Hiroto Honda; Kenjiro Uesugi; Shiyu Xiao; Masahiro Uemukai; Tomoyuki Tanigawa; Ryuji Katayama; Hideto Miyake

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[18p-B401-1~13] 15.4 III-V-group nitride crystals

Sat. Mar 18, 2023 1:00 PM - 4:30 PM B401 (Building No. 2)

Motoaki Iwaya(Meijo Univ.), Shuhei Ichikawa(Osaka Univ.)

1:15 PM - 1:30 PM

[18p-B401-2] Fabrication of Multiple Polarity Inverted AlN Structures by Multiple Sputtering and High-Temperature Annealing

〇Tomohiro Tamano¹, Kanako Shojiki^2,3, Hiroto Honda³, Kenjiro Uesugi^4,5, Shiyu Xiao², Masahiro Uemukai³, Tomoyuki Tanigawa³, Ryuji Katayama³, Hideto Miyake² (1.Fac.of Eng.Mie Univ., 2.Grad.sch.of Eng.Mie Univ., 3.Grad.sch.of Eng.Osaka Univ., 4.MRPCO, 5.Grad.sch.of RIS.Mie Univ.)

Keywords:aluminum nitride, Sputtering, Multiple Polarity Inverted