Nano-structural ceramic film with high breakdown field strength by T-AGD technology (Part 3)

Eiji FUCHITA

Presentation information

Special Interest Session: New Development of Powder Processing under Eternal Fields

Thu. Oct 24, 2019 1:00 PM - 2:00 PM Room II (1F, Symposion Hall)

Chairperson:Hiroyuki MUTO(Toyohashi University of Technology)

1:30 PM - 1:45 PM

[2-54A] Nano-structural ceramic film with high breakdown field strength by T-AGD technology (Part 3)

*Eiji FUCHITA¹, Hisanori TANIMOTO², Yoshio SAKKA³ (1. Fuchita Nanotechnology Ltd., 2. University of Tsukuba, 3. National Institute for Materials Science)

Keywords:Ceramics film formation at ambient temperatures, Nano-structural, Aerosol gas deposition, plasma, sputter

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