2023年日本表面真空学会学術講演会

講演情報

口頭発表

[1Ga01-10] Thin Film (TF)

2023年10月31日(火) 09:45 〜 12:30 中会議室231 (3階)

Chair:中塚 理(名古屋大学)

11:45 〜 12:00

[1Ga08] Fabrication of La0.95Sr0.05F2.95 epitaxial thin films and evaluation of F conduction properties

*Kazusa Takahashi1, Ryota Shimizu2, Asuka Oi1, Kehan Huo2, Shigeru Kobayashi2, Kazunori Nishio1, Taro Hitosugi2,1 (1. Tokyo Institute of Technology, 2. The University of Tokyo)

Alkaline-earth doped lanthanum trifluoride (La1−xBaxF3−x, La1−xSrxF3−x) has attracted much attention as a solid electrolyte in all-solid-state fluoride ion batteries. Aiming for quantitative evaluation of F conductivity, we reported the fabrication of La1−xBaxF3−x epitaxial thin film. However, since Ba is located next to La in the periodic table, it is difficult to analyze the composition of the thin films, hindering the exact amount of substitution. In this study, we focus on Sr instead of Ba, and report on the fabrication of La1xSrxF3x (x=0.05) epitaxial thin films using reactive sputtering and the characterization of their ionic conductivity. By tuning the partial pressure of CF4 as a reactive gas during sputtering, we successfully fabricated (001)-oriented La0.95Sr0.05F2.95 epitaxial thin films. Thus, we obtained F conductivity of ~6.6×10−3 Scm−1 at 150°C, consistent with that in bulk.

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