[1Gp01-06] Thin Film (TF)

[1Gp01(招待講演)] Formation of thin films by Cat-CVD for photovoltaic application

*Keisuke Ohdaira¹ (1. Japan Advanced Institute of Science and Technology)

The fundamentals of Cat-CVD and its photovoltaic application are reviewed. Cat-CVD can produce amorphous silicon (a-Si) films with good surface passivation ability on the surface of crystalline silicon wafers, and Cat-CVD a-Si films are thus widely used in silicon heterojunction (SHJ) solar cells. Cat-CVD silicon nitride (SiN_x) can be used as anti-reflection coating and passivation films for crystalline silicon solar cells. It has been recently demonstrated that ultra-thin Cat-CVD SiN_x films are available for the tunneling layer of a carrier selective contact. In addition, by taking advantage of the ability of Cat-CVD to deposit high-density thin films even at low temperatures, CVD SiN_x films are also used as gas barrier films protecting materials and devices with low temperature and humidity tolerance such as organic light-emitting diodes (OLEDs) and perovskite solar cells.