2023年日本表面真空学会学術講演会

講演情報

国際シンポジウム

[2Cp01-10] Celebration of the New Inter-society Alliances in Asia and Pacific Rim

2023年11月1日(水) 14:00 〜 18:25 大会議室234 (3階)

Chair:Yasunori Tanimoto(KEK)、Wilson Agerico Diño(Osaka University)

14:50 〜 15:15

[2Cp03] The fabrication of intrinsically patterned two-dimensional materials by a direct selenization method

*Yuyang Zhang1,3, Xiao Lin1,3, Yeliang Wang2,3, Shixuan Du3,1, Hong-Jun Gao3,1 (1. University of Chinese Academy of Sciences, 2. Beijing Institute of Technology, 3. Institute of Physics, Chinese Academy of Sciences)

Two-dimensional (2D) materials have been studied extensively as monolayers, vertical or lateral heterostructures. To achieve functionalization, monolayers are often patterned using soft lithography and selectively decorated with molecules. Here we demonstrate the growth of a family of 2D materials that are intrinsically patterned. Three different intrinsically patterned 2D materials have been fabricated by a directly selenization method. Adsorption of different species at preferred pattern sites is also achieved, demonstrating that these materials can serve as templates for selective self-assembly of molecules or nanoclusters, as well as for the functionalization of the same substrate with two different species.

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