[2P12] Characterizing Metal-Insulator Transition dynamics in VO2 thin film by using s-SNOM
Vanadium dioxide (VO2) thin films exhibit a metal–insulator transition (MIT) with sensitivity to the lattice strain [1, 2]. Substrates with step and terrace structures could be an attractive platform for growing high-quality thin films using the atomically-ordered surface structures. Thus, a prominent lattice strain effect could be derived using VO2 thin films on these substrates. In this study, we grew VO2 thin films on TiO2(110) substrates with step and terrace structures to investigate their crystallinity and MIT dynamics in real space, by using X-Ray Diffraction (XRD) and scattering-type Scanning Near-field Optical Microscopy (s-SNOM).
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