[3Cp01-06] ISSP2024 pre-session - A new dawn of sputtering and plasma processes: Sputtering and Plasma Processes Division's Session

[3Cp02] Effect of crystal growth of HiPIMS deposited Cr₂O₃ interlayer on the growth of Al₂O₃ coatings

*Yuya Takahashi¹, Naoto Saito¹, Kazuhiro Hikida², Sohei Nonaka², Tetsuhide Shimizu¹ (1. Tokyo Metropolitan University, 2. Mitsubishi Materials Corporation)

α-Cr₂O₃ have been grown as a seed layer aiming to nucleate α-phase Al₂O₃ coatings by using reactive HiPIMS. By increasing substrate bias potential during the Cr₂O₃ film growth, α(006) crystal texture becomes more dominant, while randomly oriented crystals are obtained at the ground substrate potential. Effects of these crystal textures on the growth of Al₂O₃ coatings are clearly observed, showing the strong η-phase Al₂O₃ growth on the highly textured Cr₂O₃ with biased configuration. While, the Al₂O₃ films grown on the Cr₂O₃ films grown at the grounded substrate potential show the structure with less crystallinity. The role of crystal texture of the seed layer is further discussed based on the detailed local observation of the microstructure of the obtained coatings.