2023年日本表面真空学会学術講演会

講演情報

口頭発表

[3Fa01-05] Surface Engineering/Thin Film

2023年11月2日(木) 09:30 〜 10:45 中会議室223 (2階)

Chair:下村 勝(静岡大学)、市村 正也(名古屋工業大学)

10:15 〜 10:30

[3Fa04] Hydrogen-induced changes in electrical conduction properties of perovskite SmNiO3 thin film

*Ikuya Matsuzawa1, Takahiro Ozawa1, Azusa Hattori2, Hidekazu Tanaka2, Katsuyuki Fukutani1,3 (1. Institute of Industrial Science, the University of Tokyo, 2. SANKEN, Osaka University, 3. Japan Atomic Energy Agency)

The perovskite ReNiO3 (Re=rare-earth) is known to exhibit a metal-insulator transition (MIT) with temperature change. Furthermore, it was recently reported that hydrogenation increases the electrical resistance of SmNiO3 by approximately eight orders of magnitude at room temperature. The purpose of this study is to elucidate this mechanism, but the relationship between hydrogen concentration and electrical resistance, which is necessary first, is not yet understood. To investigate this relationship, hydrogenation experiments by exposure to atomic hydrogen, electrical resistivity measurements, and hydrogen concentration measurements by nuclear reaction analysis were performed in situ on SmNiO3 thin films. These results contrast starkly with the model believed so far. We previously conducted the same experiments on NdNiO3. The similarities and differences are discussed in comparison with the results.

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