Improvement of Al-doped Zinc Oxide Thin Film Deposition Conditions by Sputtering Method Using Powder Target

Tamiko Ohshima

Presentation information

Poster Session

H. Innovative Materials Processing for Sustainable Society » [H-2] Plasma-Based Synthesis, Processing and Characterization of Materials for Energy and Environment

[H2-PR18] Slot 18

Thu. Dec 16, 2021 6:30 PM - 8:30 PM H2-PR18 (G403-404)

6:30 PM - 8:30 PM

[H2-PR18-04] Improvement of Al-doped Zinc Oxide Thin Film Deposition Conditions by Sputtering Method Using Powder Target

*Tamiko Ohshima^1,4, Yusuke Hibino¹, Takeshi Ihara¹, Yoshihito Yagyu¹, Hiroharu Kawasaki¹, Yoshiaki Suda², Takahiko Satake³, Shin-ichi Aoqui³, Naho Itagaki⁴, Kazunori Koga⁴, Masaharu Shiratani⁴ (1. NIT Sasebo College (Japan), 2. NIT Ishikawa College (Japan), 3. Sojo Univ. (Japan), 4. Kyushu Univ. (Japan))

Keywords:Powder, Sputtering, AZO, TCO

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