[H2-PR18] Slot 18

[H2-PR18-04] Improvement of Al-doped Zinc Oxide Thin Film Deposition Conditions by Sputtering Method Using Powder Target

*Tamiko Ohshima^1,4, Yusuke Hibino¹, Takeshi Ihara¹, Yoshihito Yagyu¹, Hiroharu Kawasaki¹, Yoshiaki Suda², Takahiko Satake³, Shin-ichi Aoqui³, Naho Itagaki⁴, Kazunori Koga⁴, Masaharu Shiratani⁴ (1. NIT Sasebo College (Japan), 2. NIT Ishikawa College (Japan), 3. Sojo Univ. (Japan), 4. Kyushu Univ. (Japan))

キーワード：Powder, Sputtering, AZO, TCO