[H2-PR18] Slot 18

[H2-PR18-17] Structural Analysis of Hydrogenated Amorphous Carbon Films Deposited by Capacitively Coupled Plasma Chemical Vapor Deposition

*Shinjiro Ono¹, Sung Hwa Hwang¹, Takamasa Okumura¹, Kunihiro Kamataki¹, Naho Itagaki¹, Kazunori Koga^1,2, Jun Seok Oh³, Susumu Takabayashi⁴, Tatsuyuki Nakatani⁵, Masaharu Shiratani¹ (1. Kyushu Univ. (Japan), 2. National Institutes of Natural Sciences (Japan), 3. Osaka City Univ. (Japan), 4. National Institute of Technology, Ariake College (Japan), 5. Okayama University of Science (Japan))

Keywords:DLC, Plasma, CVD, Raman