[H2-PR18] Slot 18

[H2-PR18-17] Structural Analysis of Hydrogenated Amorphous Carbon Films Deposited by Capacitively Coupled Plasma Chemical Vapor Deposition

*Shinjiro Ono¹, Sung Hwa Hwang¹, Takamasa Okumura¹, Kunihiro Kamataki¹, Naho Itagaki¹, Kazunori Koga^1,2, Jun Seok Oh³, Susumu Takabayashi⁴, Tatsuyuki Nakatani⁵, Masaharu Shiratani¹ (1. Kyushu Univ. (Japan), 2. National Institutes of Natural Sciences (Japan), 3. Osaka City Univ. (Japan), 4. National Institute of Technology, Ariake College (Japan), 5. Okayama University of Science (Japan))

キーワード：DLC, Plasma, CVD, Raman