Estimation of the device characteristics of low temperature polycrystalline silicon thin film transistors through deep learning

Takayuki Kurashige

Presentation information

Oral Session

H. Innovative Materials Processing for Sustainable Society » [H-4] Smart Laser Processing for Green Technologies

[H4-O7] Slot 07

Wed. Dec 15, 2021 2:30 PM - 6:00 PM Room S (G320)

Chair: Nilesh J. Vasa (Indian Institute of Technology Madras), Siti Rahmah Aid (Universiti Teknologi Malaysia)

4:20 PM - 4:40 PM

[H4-O7-06] Estimation of the device characteristics of low temperature polycrystalline silicon thin film transistors through deep learning

*Takayuki Kurashige¹, Takahiro nagano¹, Keita Katayama¹, Akira Mizutani², Daisuke Nakamura¹, Tetsuya Goto³, Hiroshi Ikenoue^1,2 (1. Kyushu Univ. (Japan), 2. Department of Gigaphoton Next GLP, Kyushu Univ. (Japan), 3. New Industry Creation Hatchery Center, Tohoku Univ. (Japan))

Keywords:Low-temperature poly-Si, Thin-film transistor, Excimer laser annealing, Deep learning

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