Degradation of dielectric film by low-temperature plasma exposure investigated using in-situ impedance spectroscopy method

Presentation information

Poster Session

G. Process » [G-1] Advanced Plasma Processing in the New Era

Fri. Dec 15, 2023 10:00 AM - 12:00 PM Poster (Annex)

*Keiichiro Urabe¹, Junki Morozumi¹, Koji Eriguchi¹ (1. Kyoto Univ. (Japan))

Keywords:Plasma-material interaction, Impedance spectroscopy, Dielectric film property

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