[G1-P501] Poster 501

[G1-P501-09] Competition between oxidation and carbide formation on Si wafer surfaces using VHF-PECVD

*Yu-Ting Chow¹, Pei-Cheng Jiang², Chung-Tzu Chang¹, Cheng-Hsun-Tony Chang¹ (1. Department of electronic engineering, Minghsin University of Science and Technology (Taiwan), 2. Department of mechanical engineering, Minghsin University of Science and Technology (Taiwan))

キーワード：vhf-PECVD, SiO2, DLC, field emission