Patterning of Polystyrene Thin Films by Colloidal Lithography and Their Chiral Optical Properties

Rino Kaneko

[PT06-45] Patterning of Polystyrene Thin Films by Colloidal Lithography and Their Chiral Optical Properties

*Rino Kaneko¹, Yoshiro Imura¹, Ke-Hsuan Wang¹, Takeshi Kawai¹ (1. Tokyo University of Science (Japan))

Keywords:Chiral Optical Properties, Colloidal lithography, Polystyrene thin film

Please enter password to view abstract.
The password has been sent to participants by e-mail. You can also find the password on the last page of the program booklet.

Presentation information

[T6] Nanoparticles and Nanomaterials

(Poster)

[PT06-45] Patterning of Polystyrene Thin Films by Colloidal Lithography and Their Chiral Optical Properties

Password