SISPAD2023

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Oral

[Session 4] Process Simulation

Wed. Sep 27, 2023 3:20 PM - 5:00 PM Hall B

Chair: Nobuhiko Nakano (Keio Univ.), Junichi Hattori (AIST)

3:20 PM - 3:40 PM

[Session_4-01] Physics-Informed Compact Model for SF6/O2 Plasma Etching

*Lado Filipovic1, Josip Bobinac2, Julius Piso2, Tobias Reiter1 (1. CDL for Process Modeling of Semiconductor Based Devices and Sensors at the Institute for Microelectronics, TU Wien, 2. Institute for Microelectronics, TU Wien)

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