SISPAD2023

Presentation information

Oral

[Session 4] Process Simulation

Wed. Sep 27, 2023 3:20 PM - 5:00 PM Hall B

Chair: Nobuhiko Nakano (Keio Univ.), Junichi Hattori (AIST)

4:00 PM - 4:20 PM

[Session_4-03] Influence of Surface Halogenation on Silane Adsorption onto Silicon Surfaces for Poly-Si Epitaxy: A Density Functional Theory Study with Neural Network Potential

*Hyunhak Jeong1, Byungjo Kim1, Youjung Kim2, Hanmei Choi2, Suyoung Yoo1, Sang Ki Nam1 (1. Mechatronics Res., Samsung Electronics, 2. Semiconductor R&D Center, Samsung Electronics)

Abstract password authentication.
Password is required to view the abstract. Please enter a password to authenticate.

Password