2019 International Conference on Solid State Devices and Materials

Presentation information

Oral Presentation

01: Advanced CMOS: Material Fundamentals, Process Science and Device Physics

[N-3] Steep Slope Transistor

Wed. Sep 4, 2019 9:00 AM - 10:30 AM IB Lecture Hall (IB 2F)

Session Chair: M. Kobayashi (Univ. of Tokyo), N. Mise (Hitachi High-Technologies Corp.)

9:00 AM - 9:30 AM

[N-3-01 (Invited)] Studies of Ferroelectric HfO2 Materials before Memory and Logic Applications

S. Migita1 (1.AIST (Japan))

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