2:00 PM - 2:30 PM
[E-2-01 (Invited)] In-situ observations of crystal growth behaviors of silicon during solidification
〇Kozo Fujiwara1 (1. Tohoku Univ. (Japan))
Oral Presentation
10: Thin Film Electronics: Oxide / Non-single Crystalline / Novel Process
Tue. Sep 27, 2022 2:00 PM - 4:00 PM 105 (1F)
Session Chair: Shin-ichiro Kuroki (Hiroshima Univ.), Ryo Matsumura (NIMS)
2:00 PM - 2:30 PM
〇Kozo Fujiwara1 (1. Tohoku Univ. (Japan))
2:30 PM - 2:45 PM
〇Wenchang Yeh1, Masato Ohya1, Yusaku Magari1 (1. Shimane University (Japan))
2:45 PM - 3:00 PM
〇Cheng-Kuei Lee1, Po-Hsun Yu1, Chang-Mao Wu1, Pei-Wen Li1, Horng-Chih Lin1 (1. National Yang Ming Chiao Tung Univ. (Taiwan))
3:00 PM - 3:15 PM
〇Po-Yi Kuo1, Po-Yang Huang1, Yu-Cheng Chou1, Cing-Long Huang1, Yu-Ming Chiu1 (1. Department of Electronic Engineering, Feng Chia University (Taiwan))
3:15 PM - 3:30 PM
〇Kenta Moto1,2, Kaoru Toko3, Tomonari Takayama1, Toshifumi Imajo3, Keisuke Yamamoto1 (1. Kyushu Univ. (Japan), 2. JSPS Research Fellow (Japan), 3. Univ. of Tsukuba (Japan))
3:30 PM - 3:45 PM
〇Rahmat Hadi Saputro1,2, Ryo Matsumura1, Naoki Fukata1,2 (1. NIMS (Japan), 2. Univ. of Tsukuba (Japan))
3:45 PM - 4:00 PM
〇Manabu Tezura1, Takanori Asano1, Riichiro Takaishi1, Mitsuhiro Tomita1, Masumi Saitoh1, Hiroki Tanaka1 (1. KIOXIA Corp. (Japan))
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