[B-6] Advanced materials, Nanofabrication, and Thin Films II

[B-6-06] Formation of Ultra-thin NiGe film with Mono-crystalline Phase and Smooth Surface

〇Shunsuke Nishimura¹, Noriyuki Taoka¹, Akio Ohta¹, Katsunori Makihara¹, Seiichi Miyazaki¹ (1. Univ. of Nagoya (Japan))

Presentation style: Online

https://doi.org/10.7567/SSDM.2022.B-6-06

Ni and Ge films with various thicknesses are formed on a SiO2 layer. Ni-germanides were formed by annealing in an N2 ambient condition. Consequently, an ultra-thin Ni-germanide film with a mono-crystalline phase and a smooth surface was successfully formed. In the formation, reductive and oxidative reactions occurred in the films, which are quite important for determining a composition of the Ni-germanide.