[E-3] Oxide Semiconductor TFT

[E-3-05] Atomic Layer Deposited Ultra-Thin Indium Zinc Oxide Channel Thin Film Transistor

Yan-Kui Liang¹, 〇Wei-Li Lee¹, Jing-Wei Lin¹, Sih-Rong Wu¹, Tsung-Ying Yang¹, Li-Chi Peng¹, Tsung-Te Chou², Chi-Chung Kei², Edward-Yi Chang¹, Chun-Hsiung Lin¹ (1. National Yang Ming Chiao Tung University (Taiwan), 2. Taiwan Instrument Research Institute, National Applied Research Laboratories (Taiwan))

Presentation style: On-site (in-person)

https://doi.org/10.7567/SSDM.2022.E-3-05