Evaluate the Impact of Process Variations on Storage Node Contact Area Under Different Etching Models

講演情報

Oral Presentation

02: Advanced and Emerging Memories / New Applications

2022年9月29日(木) 16:00 〜 17:45 303 (3F)

Session Chair: Norikatsu Takaura (Hitachi, Ltd.), Soichi Sugiura (Micron Technology Inc.)

16:30 〜 16:45

〇Ye Xiao Yu¹, Zhong Ming Liu¹, Jing Si Cui¹ (1. Changxin corporate (China))

Presentation style: Online

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