Growth of SiC Thin Film on Various Metal Substrates by CVD Using Vinylsilane

Koki Ono

doi:https://doi.org/10.7567/SSDM.2022.K-6-04

Presentation information

Oral Presentation

03: Interconnect / 3D Integrations / MEMS

[K-6] MEMS and Advanced Metallization I

Wed. Sep 28, 2022 1:30 PM - 3:30 PM 304 (3F)

Session Chair: Shigeo Yasuhara (Japan Advanced Chemicals Ltd.), Kenji Shiojima (Univ. of Fukui)

2:30 PM - 2:45 PM

[K-6-04 (Late News)] Growth of SiC Thin Film on Various Metal Substrates by CVD Using Vinylsilane

〇Koki Ono¹, Takashi Koide¹, Yong Jin², Yuuki Tsutiizu¹, Takuhiro Hasegawa¹, Shigeo Yasuhara², Wakana Takeuchi¹ (1. Aichi Institute Technology (Japan), 2. Japan Advanced Chemicals Ltd. (Japan))

Presentation style: On-site (in-person)

https://doi.org/10.7567/SSDM.2022.K-6-04

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