Growth of SiC Thin Film on Various Metal Substrates by CVD Using Vinylsilane

Koki Ono

doi:https://doi.org/10.7567/SSDM.2022.K-6-04

講演情報

Oral Presentation

03: Interconnect / 3D Integrations / MEMS

[K-6] MEMS and Advanced Metallization I

2022年9月28日(水) 13:30 〜 15:30 304 (3F)

Session Chair: Shigeo Yasuhara (Japan Advanced Chemicals Ltd.), Kenji Shiojima (Univ. of Fukui)

14:30 〜 14:45

[K-6-04 (Late News)] Growth of SiC Thin Film on Various Metal Substrates by CVD Using Vinylsilane

〇Koki Ono¹, Takashi Koide¹, Yong Jin², Yuuki Tsutiizu¹, Takuhiro Hasegawa¹, Shigeo Yasuhara², Wakana Takeuchi¹ (1. Aichi Institute Technology (Japan), 2. Japan Advanced Chemicals Ltd. (Japan))

Presentation style: On-site (in-person)

https://doi.org/10.7567/SSDM.2022.K-6-04

Abstract password authentication.
Password to download abstracts has been informed in the confirmation mail.

講演情報

[K-6] MEMS and Advanced Metallization I

[K-6-04 (Late News)] Growth of SiC Thin Film on Various Metal Substrates by CVD Using Vinylsilane

パスワード