"A Novel Solution to improve Static and Dynamic Retention Characteristics by Enhancing Hydrogen Passivation with in-situ LD-TEOS/TEOS Dual Layer"

JIEUN LEE

doi:https://doi.org/10.7567/SSDM.2023.E-3-04

講演情報

Oral Presentation

02: Advanced and Emerging Memories / New Applications

[E-3] DRAM

2023年9月7日(木) 09:00 〜 10:00 Room E (223, Bldg. 2)

Session Chairs: E Ray Hsieh (National Central Univ.), Atsushi Himeno (Panasonic Holdings Corporation)

09:45 〜 10:00

[E-3-04] "A Novel Solution to improve Static and Dynamic Retention Characteristics by Enhancing Hydrogen Passivation with in-situ LD-TEOS/TEOS Dual Layer"

^○JIEUN LEE¹, Dongkyu Jang¹, Inkyum Lee¹, Shindeuk Kim¹, Taehoon Park¹, Hyeongsun Hong¹ (1. Samsung Electronics Corp. (Korea))

https://doi.org/10.7567/SSDM.2023.E-3-04

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講演情報

[E-3] DRAM

[E-3-04] "A Novel Solution to improve Static and Dynamic Retention Characteristics by Enhancing Hydrogen Passivation with in-situ LD-TEOS/TEOS Dual Layer"

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