Variable Photocurrent Method Characterization of Subgap Defects in In <sub>2</sub>O <sub>3</sub> TFT

Kuo Zhang

doi:https://doi.org/10.7567/SSDM.2023.E-5-05

講演情報

Oral Presentation

10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process

[E-5] Oxide semiconductor TFTs and technology

2023年9月8日(金) 09:00 〜 10:15 Room E (223, Bldg. 2)

Session Chairs: Juan Paolo Bermundo (NAIST), Jun Koyama (Semiconductor Energy Lab.)

10:00 〜 10:15

[E-5-05] Variable Photocurrent Method Characterization of Subgap Defects in In ₂O ₃ TFT

^○Kuo Zhang^1,2, Jiayi Wang¹, Yang Xu¹, Nannan You¹, Qian Zhang^1,2, Yu Wang^1,2, Shengkai Wang^1,2 (1. Inst. of Microelectronics of the Chinese Academy of Sci. (China), 2. Univ. of Chinese Academy of Sci. (China))

https://doi.org/10.7567/SSDM.2023.E-5-05

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講演情報

[E-5] Oxide semiconductor TFTs and technology

[E-5-05] Variable Photocurrent Method Characterization of Subgap Defects in In 2O 3 TFT

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[E-5-05] Variable Photocurrent Method Characterization of Subgap Defects in In ₂O ₃ TFT